The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2021

Filed:

Nov. 09, 2017
Applicant:

Volkswagen Aktiengesellschaft, Wolfsburg, DE;

Inventors:

Christian Merfels, Braunschweig, DE;

Thorsten Hehn, Wolfsburg, DE;

Marcel Geppert, Freiburg, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01S 19/49 (2010.01); G01C 21/16 (2006.01); G01S 13/86 (2006.01); G01S 19/41 (2010.01); G01S 13/931 (2020.01); G01S 19/48 (2010.01); G01S 19/40 (2010.01); G01S 7/48 (2006.01); G01S 17/86 (2020.01); G01S 17/931 (2020.01);
U.S. Cl.
CPC ...
G01C 21/165 (2013.01); G01S 7/4808 (2013.01); G01S 13/86 (2013.01); G01S 13/931 (2013.01); G01S 17/86 (2020.01); G01S 17/931 (2020.01); G01S 19/40 (2013.01); G01S 19/41 (2013.01); G01S 19/48 (2013.01); G01S 19/49 (2013.01);
Abstract

The present invention relates to a method for estimating an individual position. In order to improve the estimation of the individual position of a vehicle, for example, at least one first position measurement is carried out by a first positioning system and at least one second position measurement is carried out by at least one second positioning system. A third position measurement is also carried out by the first positioning system. The third position measurement is carried out after the first and second position measurements. The individual position is estimated on the basis of at least the third position measurement and at least one position error value. The position error value is determined on the basis of the at least one first position measurement and the at least one second position measurement.


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