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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11078337 B1

PDFFull Text
Date of Patent:
Aug. 03, 2021

Filed:

Dec. 14, 2017

High-χ block copolymers for directed self-assembly

Applicant:

Brewer Science Inc., Rolla, MO (US);

Inventors:

Daniel Sweat, Rolla, MO (US);

Kui Xu, Rolla, MO (US);

Assignee:

Brewer Science, Inc., Rolla, MO (US);

Attorney:

Hovey Williams LLP

Primary Examiner:

Austin Murata

Int. Cl.
CPC ...
C08G 81/00 (2006.01); C08G 81/02 (2006.01); C08F 293/00 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); C08L 87/00 (2006.01); H01L 21/027 (2006.01); G03F 7/32 (2006.01); C08G 63/08 (2006.01); G03F 7/00 (2006.01); C08L 53/00 (2006.01); C08G 65/40 (2006.01); B32B 27/28 (2006.01);
U.S. Cl.
CPC ...
C08G 81/027 (2013.01); B32B 27/28 (2013.01); C08F 293/00 (2013.01); C08F 293/005 (2013.01); C08G 63/08 (2013.01); C08G 65/40 (2013.01); C08G 81/02 (2013.01); C08L 53/00 (2013.01); C08L 87/00 (2013.01); C08L 87/005 (2013.01); G03F 7/0002 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/327 (2013.01); H01L 21/0271 (2013.01); C08F 2438/03 (2013.01); C08L 2201/56 (2013.01); C08L 2203/20 (2013.01);
Abstract

The present invention is broadly concerned with novel directed self-assembly compositions, processes utilizing those compositions, and the resulting structures that are formed. The composition comprises a block copolymer of polystyrene and a polymethylmethacrylate block with polylactic acid side chains ('PS-b-P(MMA-LA)'). The block copolymer is capable of crosslinking and micro-phase separating into lines and spaces measuring about 10-nm or smaller with sub-20 nm Lcapability. Additionally, PS-b-P(MMA-LA) can be thermally annealed without a top-coat for simpler processing than the prior art. The polylactic acid side chains also increase the etch rate of the poly(methylmethacrylate) block when exposed to oxygen plasma, as well as lower the T.

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