The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2021
Filed:
Oct. 15, 2018
Cornell University, Ithaca, NY (US);
Cornell University, Ithaca, NY (US);
Abstract
The present disclosure may be embodied as a method for creating a restriction pattern from a mask material having a strain (ε) an for mapping elastomeric membrane having a strain (ε) into a target 3D shape. The method may include discretizing the target 3D shape into a plurality of radial segments, and a radial strain (ε) is determined for each radial position (r) on each radial segment of the plurality of radial segments. A restriction pattern is determined, wherein the restriction pattern comprises a quantity of mask material for each position r to provide a composite strain (ε, ε). In some embodiments, the method further includes depositing a first membrane layer into a mold and placing mask material into the first membrane layer according to the determined restriction pattern. The first membrane layer is cured.