The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 27, 2021

Filed:

Oct. 25, 2016
Applicant:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Inventors:

Marc Delaunay, Meylan, FR;

Anne Ghis, Saint Martin d'Heres, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/06 (2006.01); C23C 14/35 (2006.01); H05H 1/46 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32678 (2013.01); C23C 14/0605 (2013.01); C23C 14/357 (2013.01); H01J 37/3266 (2013.01); H01J 37/32192 (2013.01); H01J 37/32229 (2013.01); H01J 37/32651 (2013.01); H01J 37/345 (2013.01); H05H 1/46 (2013.01); H01J 37/3426 (2013.01); H05H 2001/4622 (2013.01); H05H 2245/124 (2013.01);
Abstract

A device for producing an amorphous carbon layer by electron cyclotron resonance plasma, the device including a plasma chamber; a gas supply; a magnetic mirror; a waveguide extending along a reference axis; a system for injecting microwave power; a magnetic field generator for generating a magnetic field in the plasma chamber, the magnetic field generator being configured to create a beam of magnetic field lines along which plasma is diffused; a target made from carbon; a substrate holder, wherein the target is arranged at a distance from the reference axis of between R/2 and R, and wherein the device further includes a screen arranged between the waveguide and the substrate holder.


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