The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2021
Filed:
Aug. 06, 2019
International Business Machines Corporation, Armonk, NY (US);
Eric Foreman, Fairfax, VT (US);
Ning Lu, Essex Junction, VT (US);
Jeffrey Hemmett, St. George, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
According to one embodiment, a method, computer system, and computer program product for creating a plurality of process parameters in a circuit design is provided. The present embodiment of the invention may include receiving one parasitic extraction per layer of a circuit is used to obtain a resistance base factor and a capacitance base factor. The embodiment may further include performing Monte Carlo simulations to determine distributions of capacitance and resistance for each metal layer of the circuit, and creating scalars that scale each of the resistance base factor and the capacitance base factor to a minimum and maximum process limit. Additionally, the embodiment may include defining at least one delay corner using the created scalars, and receiving the results of one or more timing analyses performed using the resistance base factor and the capacitance base factor, and the defined delay corner to determine a delay variability per layer.