The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 27, 2021

Filed:

Jul. 27, 2018
Applicant:

Robert Bosch Gmbh, Stuttgart, DE;

Inventors:

Panpan Xu, Sunnyvale, CA (US);

Liu Ren, Cupertino, CA (US);

Yuanzhe Chen, Sai Kung District, HK;

Assignee:

Robert Bosch GmbH, Stuttgart, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 15/16 (2006.01); G06F 16/28 (2019.01); G06F 9/54 (2006.01); G06F 16/26 (2019.01); G06F 16/901 (2019.01); G06F 16/2458 (2019.01); G06F 16/248 (2019.01);
U.S. Cl.
CPC ...
G06F 16/287 (2019.01); G06F 9/542 (2013.01); G06F 16/248 (2019.01); G06F 16/2477 (2019.01); G06F 16/26 (2019.01); G06F 16/9024 (2019.01);
Abstract

A method for generating a graphical depiction of summarized event sequences includes receiving a plurality of event sequences, each event sequence in the plurality of event sequences including a plurality of events, and generating a plurality of clusters using a minimum description length (MDL) optimization process. Each cluster in the plurality of clusters including a set of at least two event sequences in the plurality of event sequences that maps to a pattern in each cluster. The pattern in each cluster further includes a plurality of events included in at least one event sequence in the set of at least two event sequences in the cluster. The method includes generating a graphical depiction of a first cluster in the plurality of clusters, the graphical depiction including a graphical depiction of a first plurality of events in the pattern of the first cluster.


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