The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 27, 2021

Filed:

May. 13, 2020
Applicant:

The Trustees of Columbia University IN the City of New York, New York, NY (US);

Inventors:

Michal Lipson, New York, NY (US);

Mohammad Amin Tadayon, Bronx, NY (US);

Aseema Mohanty, New York, NY (US);

Felippe Barbosa, Campinas, BR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/12 (2006.01); G02B 6/13 (2006.01); G02B 6/24 (2006.01); G02B 6/124 (2006.01); G02B 6/136 (2006.01); G02B 6/122 (2006.01); G02B 1/04 (2006.01);
U.S. Cl.
CPC ...
G02B 6/1245 (2013.01); G02B 1/045 (2013.01); G02B 6/1221 (2013.01); G02B 6/136 (2013.01); G02B 6/241 (2013.01); G02B 2006/12176 (2013.01);
Abstract

A probe structure includes a monolithically integrated waveguide and lens. The probe is based on SU-8 as a guiding material. A waveguide mold is defined using wet etching of silicon using a silicon dioxide mask patterned with 45° angle with respect to the silicon substrate edge and an aluminum layer acting as a mirror is deposited on the silicon substrate. A lens mold is made using isotropic etching of the fused silica substrate and then aligned to the silicon substrate. A waveguide polymer such as SU-8 2025 is flowed into the waveguide mask+lens mold (both on the same substrate) by decreasing its viscosity and using capillary forces via careful temperature control of the substrate.


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