The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2021
Filed:
Mar. 05, 2018
Applicant:
Lpkf Laser & Electronics Ag, Garbsen, DE;
Inventors:
Roman Ostholt, Langenhagen, DE;
Norbert Ambrosius, Garbsen, DE;
Arne Schnoor, Hannover, DE;
Daniel Dunker, Hannover, DE;
Kevin Hale, Garbsen, DE;
Moritz Doerge, Suthfeld, DE;
Stephan Wenke, Neustadt am Ruebenberge, DE;
Assignee:
LPKF LASER & ELECTRONICS AG, Garbsen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/53 (2014.01); C23C 14/04 (2006.01); B23K 103/00 (2006.01);
U.S. Cl.
CPC ...
B23K 26/53 (2015.10); C23C 14/042 (2013.01); B23K 2103/54 (2018.08);
Abstract
A method for producing a technical mask includes: providing a technical mask including at least one plate-shaped substrate, the plate-shaped substrate being transparent to at least one laser wavelength; and producing at least one opening in the mask by laser-induced deep etching. In an embodiment, an etching attack takes place at least temporarily on one side during laser-induced deep etching.