The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 27, 2021

Filed:

Jul. 21, 2016
Applicant:

Confluent Medical Technologies, Inc., Fremont, CA (US);

Inventor:

Thomas Duerig, Fremont, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61F 2/07 (2013.01); A61F 2/844 (2013.01); A61F 2/915 (2013.01);
U.S. Cl.
CPC ...
A61F 2/07 (2013.01); A61F 2/844 (2013.01); A61F 2/915 (2013.01); A61F 2002/072 (2013.01); A61F 2002/91533 (2013.01); A61F 2002/91575 (2013.01); A61F 2002/91583 (2013.01); A61F 2210/0057 (2013.01); A61F 2210/0076 (2013.01); A61F 2240/00 (2013.01); A61F 2240/001 (2013.01); A61F 2250/0036 (2013.01);
Abstract

A stent-graft assembly is provided for a variety of medical treatments. The stent-graft assembly includes a stent disposed to and attached between an inner layer of graft material and an outer layer of graft material. One of both of the graft layers includes one or more of a depression, dimple or detent that increases the localized surface area of the graft in one or more portions of the stent otherwise susceptible to graft stretching in the absence of the depression, dimple or detent. There is also described a method of forming dimples in selective locations on one or port graft layers in one or more locations relative to a portion of the stent where a portion of the graft may be susceptible to stretching or tearing during crimping or loading operations.


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