The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2021

Filed:

Apr. 11, 2019
Applicant:

Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Wuhan, CN;

Inventors:

Peng Wang, Wuhan, CN;

Jinxue Weng, Wuhan, CN;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/02 (2006.01);
U.S. Cl.
CPC ...
H05K 1/028 (2013.01); H05K 2201/10128 (2013.01);
Abstract

A metal trace is provided to include a plurality of metal traces disposed side by side on a bending region, and each of the metal traces includes a trace body, and the trace body is provided with a plurality of through holes, and the plurality of through holes are used to reduce bending stress received by the metal traces, and the plurality of through holes are spaced apart along an extending direction of the trace body. The plurality of through holes are disposed on the trace body to reduce bending stress on the metal traces.


Find Patent Forward Citations

Wang, Peng. (2021). Metal trace (U.S. Patent No. 11071200). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11071200

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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