The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2021

Filed:

Oct. 22, 2018
Applicant:

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Giovanni Ferrara, Ibaraki, JP;

Daisuke Inokuchi, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 35/24 (2006.01); H01L 31/18 (2006.01); H01L 31/042 (2014.01); H01L 51/42 (2006.01); H01L 27/30 (2006.01); H01L 51/00 (2006.01); G06K 9/00 (2006.01); H04N 5/361 (2011.01);
U.S. Cl.
CPC ...
H01L 51/424 (2013.01); H01L 27/307 (2013.01); H01L 51/0003 (2013.01); G06K 9/00087 (2013.01); H01L 51/0036 (2013.01); H01L 51/0039 (2013.01); H01L 51/0043 (2013.01); H01L 51/0047 (2013.01); H04N 5/361 (2013.01);
Abstract

A photoelectric conversion element capable of reducing a specific dark current. In a photoelectric conversion element () including an anode (), a cathode (), and an active layer () provided between the anode and the cathode, the active layer contains a p-type semiconductor material having a band gap of 0.5 eV to 1.58 eV, and an n-type semiconductor material, the n-type semiconductor material is a Cfullerene derivative, and on an image obtained by binarizing an image of the active layer observed by a transmission electron microscope, the junction length between a phase of the n-type semiconductor material and a phase of the p-type semiconductor material is 120 μm to 170 μm per square micrometer of the area of the binarized image.


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