The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2021

Filed:

Dec. 17, 2019
Applicant:

Lumileds Llc, San Jose, CA (US);

Inventors:

Tsutomu Ishikawa, San Jose, CA (US);

Isaac Wildeson, San Jose, CA (US);

Erik Charles Nelson, Pleasanton, CA (US);

Parijat Deb, San Jose, CA (US);

Assignee:

LUMILEDS LLC, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/32 (2010.01); H01L 21/268 (2006.01); H01L 21/02 (2006.01); C23C 16/48 (2006.01); H01L 33/00 (2010.01); C23C 16/30 (2006.01); H01L 33/06 (2010.01); H01L 33/02 (2010.01);
U.S. Cl.
CPC ...
H01L 33/32 (2013.01); C23C 16/303 (2013.01); C23C 16/482 (2013.01); H01L 21/0254 (2013.01); H01L 21/0262 (2013.01); H01L 21/02458 (2013.01); H01L 21/02579 (2013.01); H01L 21/2686 (2013.01); H01L 33/0062 (2013.01); H01L 33/0075 (2013.01); H01L 33/0095 (2013.01); H01L 33/06 (2013.01); H01L 33/025 (2013.01);
Abstract

Described herein are methods for growing light emitting devices under ultra-violet (UV) illumination. A method includes growing a III-nitride n-type layer over a III-nitride p-type layer under UV illumination. Another method includes growing a light emitting device structure on a growth substrate and growing a tunnel junction on the light emitting device structure, where certain layers are grown under UV illumination. Another method includes forming a III-nitride tunnel junction n-type layer over the III-nitride p-type layer to form a tunnel junction light emitting diode. A surface of the III-nitride tunnel junction n-type layer is done under illumination during an initial period and a remainder of the formation is completed absent illumination. The UV light has photon energy higher than the III-nitride p-type layer's band gap energy. The UV illumination inhibits formation of Mg—H complexes within the III-nitride p-type layer resulting from hydrogen present in a deposition chamber.


Find Patent Forward Citations

Loading…