The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2021

Filed:

Mar. 16, 2020
Applicants:

Globalfoundries U.s. Inc., Malta, NY (US);

Imec Vzw, Leuven, BE;

Inventors:

Bartlomiej J. Pawlak, Leuven, BE;

Clement J. E. Porret, Kessel-Lo, BE;

Srinivasan Ashwyn Srinivasan, Heverlee, BE;

Assignees:

GLOBALFOUNDRIES U.S. Inc., Malta, NY (US);

IMEC vzw, Leuven, BE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/028 (2006.01); H01L 31/105 (2006.01); G02F 1/225 (2006.01); G02F 1/015 (2006.01); G02F 1/025 (2006.01); G02B 6/13 (2006.01); G02B 6/42 (2006.01); H01L 33/06 (2010.01); H01L 33/26 (2010.01); H01L 33/14 (2010.01); H01L 33/00 (2010.01);
U.S. Cl.
CPC ...
H01L 33/06 (2013.01); H01L 33/0016 (2013.01); H01L 33/14 (2013.01); H01L 33/26 (2013.01);
Abstract

Disclosed is a quantum-confined Stark effect (QCSE) modulator. In the modulator, a first doped semiconductor region has a first type conductivity, is at the bottom of a trench in a dielectric layer and is immediately adjacent to a semiconductor layer. An MQW region is in the trench on the first doped semiconductor region and at least upper segments of sidewalls of the MQW region are angled away from adjacent sidewalls of the trench such that there are spaces between the MQW region and the dielectric layer. Dielectric spacers fill the spaces. A second doped semiconductor region has a second type conductivity, is on top of the MQW region and optionally extends laterally onto the tops of the dielectric spacers. The spacers prevent shorting of the doped semiconductor regions. Also disclosed are embodiments of a photonics structure including the modulator and of methods for forming the modulator and the photonics structure.


Find Patent Forward Citations

Loading…