The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2021

Filed:

Oct. 15, 2019
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Andreas Meiser, Sauerlach, DE;

Oliver Haeberlen, St. Magdalen, AT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/40 (2006.01); H01L 21/3115 (2006.01); H01L 29/417 (2006.01); H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/78 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/408 (2013.01); H01L 21/31155 (2013.01); H01L 29/0696 (2013.01); H01L 29/401 (2013.01); H01L 29/404 (2013.01); H01L 29/407 (2013.01); H01L 29/41766 (2013.01); H01L 29/66696 (2013.01); H01L 29/66704 (2013.01); H01L 29/7825 (2013.01); H01L 29/0865 (2013.01); H01L 29/1083 (2013.01); H01L 29/1095 (2013.01);
Abstract

A semiconductor device includes a transistor in a semiconductor body having a main surface. The transistor includes a source region; a drain region; a body region; a drift zone; a gate electrode at the body region, the body region and the drift zone being disposed along a first direction between the source region and the drain region, and the first direction being parallel to the main surface; a field plate disposed in each of a plurality of field plate trenches, each of the field plate trenches having a longitudinal axis extending along the first direction; and a field dielectric layer between the field plate and the drift zone, a thickness of the field dielectric layer at a bottom of each of the field plate trenches gradually increases along the first direction, the thickness being measured along a depth direction of the plurality of field plate trenches.


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