The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2021

Filed:

Jul. 13, 2018
Applicant:

Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Hubei, CN;

Inventors:

Lei Yu, Hubei, CN;

Songshan Li, Hubei, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 21/30 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1274 (2013.01); H01L 21/02532 (2013.01); H01L 21/02675 (2013.01); H01L 21/02686 (2013.01); H01L 21/3003 (2013.01); H01L 27/1222 (2013.01); H01L 21/0262 (2013.01);
Abstract

The present disclosure relates to an array substrate, manufacturing method thereof and display device using the same. The method for manufacturing the array substrate includes: forming an amorphous silicon layer and an insulating layer covering the amorphous silicon layer in one deposition process; and processing the amorphous silicon layer to transform the amorphous silicon layer into a polysilicon layer. Through the above-mentioned method, the present disclosure can solve the problem of affecting the concentration of current carriers that caused by the oxidation of the surface of polysilicon, and improve the performance of the array substrate.


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