The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2021

Filed:

Jun. 28, 2016
Applicant:

Avanstrate Inc., Tokyo, JP;

Inventor:

Manabu Ichikawa, Yokkaichi, JP;

Assignee:

AvanStrate Inc., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); C03C 3/091 (2006.01); C03B 5/027 (2006.01); C03B 25/08 (2006.01); H01L 29/786 (2006.01); C03B 17/06 (2006.01); C03B 25/04 (2006.01); C03C 3/093 (2006.01); G02F 1/1333 (2006.01); G02F 1/1368 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1218 (2013.01); C03B 5/027 (2013.01); C03B 17/064 (2013.01); C03B 25/04 (2013.01); C03B 25/08 (2013.01); C03C 3/091 (2013.01); C03C 3/093 (2013.01); H01L 27/1222 (2013.01); H01L 27/1225 (2013.01); H01L 27/1262 (2013.01); H01L 29/7869 (2013.01); H01L 29/78603 (2013.01); H01L 29/78672 (2013.01); H01L 29/78675 (2013.01); G02F 1/1368 (2013.01); G02F 1/133302 (2021.01); G02F 2202/104 (2013.01); H01L 27/3262 (2013.01); Y02P 40/57 (2015.11);
Abstract

Provided are: a glass substrate that achieves a high strain point while having a low devitrification temperature; and a method for producing said glass substrate. This glass substrate for a display is made of a glass comprising SiOand AlO, comprising 0% or more to less than 3% BOand from 5 to 14% BaO in mass %, and substantially devoiding SbO, wherein the devitrification temperature is 1235° C. or lower and the strain point is 720° C. or higher. Alternatively, this glass substrate for a display is made of a glass comprising SiOand AlO, comprising 0% or more to less than 3% BO, 1.8% or more MgO, and from 5 to 14% BaO in mass %, and substantially devoiding SbO, wherein (SiO+MgO+CaO)—(AlO+SrO+BaO) is less than 42%, the devitrification temperature is 1260° C. or lower, and the strain point is 720° C. or higher. This method for producing said glass substrate for a display comprises: a melting step for melting, by using at least direct electrical heating, a glass material prepared to have a predetermined composition; a forming step for forming, into a flat glass sheet, the molten glass that has been melted in the melting step; and an annealing step for annealing the flat glass sheet, wherein a condition for cooling the flat glass sheet is controlled so as to reduce the heat shrinkage rate of the flat glass sheet.


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