The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2021

Filed:

Mar. 05, 2019
Applicant:

Stmicroelectronics (Rousset) Sas, Rousset, FR;

Inventors:

Abderrezak Marzaki, Aix en Provence, FR;

Mathieu Lisart, Aix en Provence, FR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/02 (2006.01); H01L 23/00 (2006.01); G06F 21/87 (2013.01); H04N 19/44 (2014.01); H01L 27/02 (2006.01); G06F 21/75 (2013.01);
U.S. Cl.
CPC ...
H01L 23/576 (2013.01); G06F 21/75 (2013.01); G06F 21/87 (2013.01); H01L 23/57 (2013.01); H01L 27/0207 (2013.01); H04N 19/44 (2014.11);
Abstract

An integrated circuit includes a first domain supplied with power at a first supply voltage. A first transistor comprising in the first domain includes a first gate region and a first gate dielectric region. A second domain is supply with power at a second supply voltage and includes a second transistor having a second gate region and a second gate dielectric region, the second gate region being biased at a voltage that is higher than the first supply voltage. The first and second gate dielectric regions have the same composition, wherein that composition configures the first transistor in a permanently turned off condition in response to a gate bias voltage lower than or equal to the first supply voltage. The second transistor is a floating gate memory cell transistor, with the second gate dielectric region located between the floating and control gates.


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