The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2021
Filed:
Nov. 15, 2019
Veeco Instruments Inc., Plainview, NY (US);
John Taddei, Jim Thorpe, PA (US);
David A. Goldberg, Plainview, NY (US);
Elena Lawrence, Media, PA (US);
Ian Cochran, Plainview, NY (US);
Christopher Orlando, Media, PA (US);
James Swallow, Plainview, NY (US);
William Gilbert Breingan, Media, PA (US);
VEECO INSTRUMENTS INC., Plainview, NY (US);
Abstract
A plurality of endpoints in a wet etching process of a substrate are determined. A plurality of benchmark end points during a wet etching process of a first substrate are determined, using first light information represented by a HSV color model for sample locations of the first substrate. Etch parameters are generated for a wet etching process for a second substrate. The generated etch parameters are used with second light information represented by at least one value of the Hue, Saturation, Value color model associated with a plurality of sample locations of the second substrate to reach respective end points during the wet etching process of a second substrate.