The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2021
Filed:
Jul. 10, 2019
Fujifilm Corporation, Tokyo, JP;
Akiyoshi Goto, Shizuoka, JP;
Masafumi Kojima, Shizuoka, JP;
Akira Takada, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
Kyohei Sakita, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by General Formula (1). In General Formula (1), X represents a sulfur atom or an iodine atom. m represents 1 or 2, in a case where X is a sulfur atom, m is 2, and in a case where X is an iodine atom, m is 1. R's each independently represent an alkyl group or alkenyl group which may include a heteroatom, an aromatic heterocyclic group, or an aromatic hydrocarbon ring group. Further, in a case where m is 2, two R's may be bonded to each other to form a ring. Rrepresents a divalent linking group. Rrepresents a divalent linking group having no aromatic group. Yrepresents an anionic moiety. The pKa of the compound represented by General Formula (1) as Yis protonated is −2.0 to 1.5.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile