The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2021

Filed:

Mar. 04, 2020
Applicant:

GM Global Technology Operations Llc, Detroit, MI (US);

Inventors:

Thomas A. Seder, Fraser, MI (US);

James A. Carpenter, Rochester Hills, MI (US);

Gayatri V. Dadheech, Bloomfield Hills, MI (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 1/115 (2015.01); B01J 21/06 (2006.01); B01J 23/50 (2006.01); B01J 35/00 (2006.01); C23C 14/08 (2006.01); C23C 14/35 (2006.01); C23C 14/58 (2006.01); G02B 1/18 (2015.01); C23C 14/06 (2006.01); C23C 14/10 (2006.01); B08B 17/06 (2006.01); B01J 37/34 (2006.01);
U.S. Cl.
CPC ...
G02B 1/115 (2013.01); B01J 21/063 (2013.01); B01J 23/50 (2013.01); B01J 35/004 (2013.01); B01J 35/0006 (2013.01); B01J 37/34 (2013.01); B08B 17/065 (2013.01); C23C 14/0605 (2013.01); C23C 14/083 (2013.01); C23C 14/086 (2013.01); C23C 14/10 (2013.01); C23C 14/35 (2013.01); C23C 14/5826 (2013.01); C23C 14/5846 (2013.01); C23C 14/5873 (2013.01); G02B 1/18 (2015.01);
Abstract

A self-cleaning film system includes a substrate and an anti-reflection film disposed on the substrate. The anti-reflection film includes a first sheet formed from titanium dioxide, a second sheet formed from silicon dioxide and disposed on the first sheet, and a third sheet formed from titanium dioxide and disposed on the second sheet. The system includes a self-cleaning film disposed on the anti-reflection film and including a monolayer disposed on the third sheet and formed from a fluorinated material selected from the group consisting of fluorinated organic compounds, fluorinated inorganic compounds, and combinations thereof. The self-cleaning film includes a first plurality of regions disposed within the monolayer such that each of the first plurality of regions abuts and is surrounded by the fluorinated material and includes a photocatalytic material.


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