The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2021

Filed:

Apr. 13, 2018
Applicant:

Horiba Stec, Co., Ltd., Kyoto, JP;

Inventor:

Hideaki Miyamoto, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05D 11/00 (2006.01); C23C 16/448 (2006.01); B01J 7/02 (2006.01); G05D 7/06 (2006.01); G05B 15/02 (2006.01); H01M 8/0662 (2016.01); B01F 3/02 (2006.01); C02F 1/50 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4485 (2013.01); B01J 7/02 (2013.01); G05B 15/02 (2013.01); G05D 7/0635 (2013.01); B01F 3/026 (2013.01); C02F 1/50 (2013.01); H01M 8/0662 (2013.01);
Abstract

A liquid material vaporization and supply device is provided in which it is possible to accurately control a flow rate even in the case where calibration data is not available for a material gas. A first tank in which a liquid material is vaporized to produce material gas; a second tank in which the material gas is contained at a predetermined pressure; a pressure sensor that senses the pressure inside the second tank; a lead-out path for leading the material gas out of the second tank; a fluid control valve that is provided to open/close the lead-out path; and a flow rate control part that, when the material gas is led out through the lead-out path, on the basis of a reduction in the pressure sensed by the pressure sensor, controls the opening level of the valve to control the flow rate of the material gas are included.


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