The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2021
Filed:
Apr. 23, 2018
Applicant:
Shanghai Tianma Micro-electronics Co., Ltd., Shanghai, CN;
Inventors:
Jian Xu, Shanghai, CN;
Yaoyang Liu, Shanghai, CN;
Assignee:
SHANGHAI TIANMA MICRO-ELECTRONICS CO., LTD., Shanghai, CN;
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); C23C 16/04 (2006.01); C23C 16/44 (2006.01); C23C 14/22 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); C23C 14/22 (2013.01); C23C 16/042 (2013.01); C23C 16/44 (2013.01);
Abstract
An embodiment of the present disclosure provides a vapor deposition device and a vapor deposition method thereof. The vapor deposition device comprises an adjustable magnet array. The adjustable magnet array comprises m magnet blocks, wherein a magnetization direction of at least one of the magnet blocks is adjustable. The vapor deposition device is used to prepare a film.
Xu, Jian. (2021). Vapor deposition device and vapor deposition method (U.S. Patent No. 11066736). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11066736
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile