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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11066571 B1

PDFFull Text
Expired
Date of Patent:
Jul. 20, 2021

Filed:

May. 30, 2017

Pattern forming method, under coating agent, and laminate

Applicant:

Oji Holdings Corporation, Tokyo, JP;

Inventors:

Kazuyo Morita, Tokyo, JP;

Kimiko Hattori, Tokyo, JP;

Assignee:

OJI HOLDINGS CORPORATION, Tokyo, JP;

Attorney:

Browdy and Neimark, PLLC

Primary Examiner:

Michael Bernshteyn

Int. Cl.
CPC ...
C09D 133/14 (2006.01); B05D 1/36 (2006.01); B05D 7/24 (2006.01); C07H 7/04 (2006.01); C07H 13/04 (2006.01); C08F 212/14 (2006.01); C08F 220/68 (2006.01); C09D 153/00 (2006.01); C08F 290/10 (2006.01); C08F 297/02 (2006.01); C07H 13/12 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
C09D 133/14 (2013.01); B05D 1/36 (2013.01); B05D 7/24 (2013.01); C07H 7/04 (2013.01); C07H 13/04 (2013.01); C07H 13/12 (2013.01); C08F 212/14 (2013.01); C08F 220/68 (2013.01); C08F 290/10 (2013.01); C08F 297/026 (2013.01); C09D 153/00 (2013.01); H01L 21/0271 (2013.01);
Abstract

It is an object of the present invention to provide a pattern forming method capable of easily forming a phase-separated structure with high accuracy, even in the case of widening the applicable range of a pattern size. The present invention relates to a pattern forming method comprising: applying an under coating agent onto a substrate, and applying a self-assembly composition for pattern formation to the surface of the substrate, onto which the under coating agent has been applied, and then forming a self-assembly film according to self-assembly phase separation, wherein the self-assembly composition for pattern formation comprises a block copolymer comprising a polymerization unit (a) having at least one selected from a structure represented by a formula () and a structure represented by a formula (), and a polymerization unit (b) having a structure represented by a formula ().

Find Patent Forward Citations

Morita, Kazuyo. (2021). Pattern forming method, under coating agent, and laminate (U.S. Patent No. 11066571). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11066571

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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