The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 2021

Filed:

Sep. 15, 2020
Applicant:

Adobe Inc., San Jose, CA (US);

Inventors:

Vivek Agrawal, Noida, IN;

Radhika Jhawar, Noida, IN;

Assignee:

Adobe Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 11/60 (2006.01); G06F 3/0484 (2013.01); G06T 11/20 (2006.01);
U.S. Cl.
CPC ...
G06T 11/60 (2013.01); G06F 3/04845 (2013.01); G06T 11/203 (2013.01);
Abstract

Symmetry axis digital content generation techniques and systems are described that support diverse types of art included in the digital content and may do so in real time as part of creating and editing symmetry art. A symmetry art generation system determines a portion of the source object, defined as encompassed by a path, that is to be reflected to generate the reflected object. As a result, the symmetry art generation system involves a reduced number of low-cost computations in order to calculate the path. The path also defines a minimized area defining a relevant portion of the source object to be reflected and thus reduces computational resource consumption by a computing device that implements these techniques and works for a wide range of art types.


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