The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 2021

Filed:

Jul. 18, 2018
Applicant:

Shenzhen Malong Technologies Co., Ltd., Shenzhen, CN;

Inventors:

Sheng Guo, Shenzhen, CN;

Weilin Huang, Shenzhen, CN;

Haozhi Zhang, Shenzhen, CN;

Chenfan Zhuang, Shenzhen, CN;

Dengke Dong, Shenzhen, CN;

Matthew R. Scott, Shenzhen, CN;

Dinglong Huang, Shenzhen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/62 (2006.01);
U.S. Cl.
CPC ...
G06K 9/6259 (2013.01); G06K 9/6221 (2013.01); G06K 9/6264 (2013.01); G06K 9/6269 (2013.01);
Abstract

Methods and systems for training machine vision models (MVMs) with 'noisy' training datasets are described. A noisy set of images is received, where labels for some of the images are 'noisy' and/or incorrect. A progressively-sequenced learning curriculum is designed for the noisy dataset, where the images that are easiest to learn machine-vision knowledge from are sequenced near the beginning of the curriculum and images that are harder to learn machine-vision knowledge from are sequenced later in the curriculum. An MVM is trained via providing the sequenced curriculum to a supervised learning method, so that the MVM learns from the easiest examples first and the harder training examples later, i.e., the MVM progressively accumulates knowledge from simplest to most complex. To sequence the curriculum, the training images are embedded in a feature space and the “complexity” of each image is determined via density distributions and clusters in the feature space.


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