The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2021
Filed:
May. 26, 2020
Beijing Naura Microelectronics Equipment Co., Ltd., Beijing, CN;
Jihong Zhang, Beijing, CN;
Jinsheng Fu, Beijing, CN;
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing, CN;
Abstract
A matching method for multiple reaction chambers includes selecting at least one factor, setting an adjustment coefficient for the factor corresponding to each of the reaction chambers, and obtaining an input value of the factor to enter into each reaction chamber based on the target value of the factor and the adjustment coefficient corresponding to each of the reaction chambers. The processing factor has a target value and a real value corresponding to each of the reaction chamber. The adjustment coefficient is based on the real value and the target value of the factor being within a preset accuracy range when the corresponding chamber operates a process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile