The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2021
Filed:
May. 29, 2019
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Hyung Ju Ryu, Daejeon, KR;
Se Jin Ku, Daejeon, KR;
Mi Sook Lee, Daejeon, KR;
Sung Soo Yoon, Daejeon, KR;
No Jin Park, Daejeon, KR;
Jung Keun Kim, Daejeon, KR;
Je Gwon Lee, Daejeon, KR;
Eun Young Choi, Daejeon, KR;
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
C08J 5/18 (2006.01); C08J 7/12 (2006.01);
U.S. Cl.
CPC ...
C08J 5/18 (2013.01); C08J 7/123 (2013.01); C08J 2325/06 (2013.01); C08J 2339/06 (2013.01); C08J 2339/08 (2013.01); C08J 2347/00 (2013.01); C08J 2367/04 (2013.01); C08J 2371/02 (2013.01);
Abstract
A method for producing a polymer film is disclosed herein. The method is capable of effectively forming a polymer film on a substrate, where the polymer film comprises highly aligned block copolymers without orientation defects, coordination number defects, distance defects, and the like. The method can be applied to production of various patterned substrates.