The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 2021

Filed:

Aug. 17, 2018
Applicant:

National Tsing Hua University, Hsinchu, TW;

Inventors:

Rong-Ming Ho, Hsinchu, TW;

Mohan Raj Krishnan, Hsinchu, TW;

Suhail Kizhakkeveettil Siddique, Hsinchu, TW;

Yu-Cheng Chien, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 41/46 (2006.01); B29C 41/00 (2006.01); B29C 37/00 (2006.01); C23C 18/16 (2006.01); C23C 18/32 (2006.01); C09D 125/06 (2006.01); C08J 7/02 (2006.01); H01G 9/20 (2006.01); G02B 1/11 (2015.01); B29K 25/00 (2006.01); B29L 7/00 (2006.01);
U.S. Cl.
CPC ...
B29C 41/46 (2013.01); B29C 37/0025 (2013.01); B29C 41/003 (2013.01); C08J 7/02 (2013.01); C09D 125/06 (2013.01); C23C 18/1641 (2013.01); C23C 18/1644 (2013.01); C23C 18/32 (2013.01); B29K 2025/06 (2013.01); B29L 2007/008 (2013.01); C08J 2325/06 (2013.01); G02B 1/11 (2013.01); H01G 9/2031 (2013.01);
Abstract

A method for fabricating nanoporous polymer thin film includes steps as follows. A polymer thin film is provided, wherein a polymer solution including a polymer is coated on a substrate to form the polymer thin film. A swelling and annealing process is provided, wherein the polymer thin film is disposed inside a chamber with a vapor of a first solvent, the polymer thin film is swollen and annealed to form a swollen polymer thin film, and the swollen polymer thin film includes the polymer and the first solvent. A freezing process is provided, wherein the swollen polymer thin film is cooled to a temperature less than or equal to a crystallization temperature of the first solvent to crystallize the first solvent. A first solvent removing process is provided, wherein the first solvent is removed with a second solvent, such that a nanoporous polymer thin film is obtained.


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