The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2021
Filed:
Feb. 05, 2020
GM Global Technology Operations Llc, Detroit, MI (US);
Thomas A. Seder, Fraser, MI (US);
James A. Carpenter, Rochester Hills, MI (US);
Gayatri V. Dadheech, Bloomfield Hills, MI (US);
GM GLOBAL TECHNOLOGY OPERATIONS LLC, Detroit, MI (US);
Abstract
A self-cleaning film system configured for reducing a visibility of a contaminant includes a substrate and a film. The film includes a monolayer defining a plurality of cavities and formed from a first material having a first surface energy, and a plurality of patches disposed within the plurality of cavities. Each of the patches is formed from a photocatalytic material having a second surface energy that is higher than the first. The film has a touchpoint area having a first use frequency, and a second area having a second use frequency that is less than the first. The patches are present in the touchpoint area in a first concentration and are configured to direct the contaminant towards the second area. The patches are present in the second area in a second concentration that is higher than the first and are configured to reduce the visibility of the contaminant.