The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 2021

Filed:

Mar. 22, 2016
Applicant:

Bühler Ag, Uzwil, CH;

Inventors:

Eduard Nater, Zuckenriet, CH;

Achim Philipp Sturm, Niederuzwil, CH;

Assignee:

BUEHLER AG, Uzwil, CH;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01F 7/00 (2006.01); B02C 17/16 (2006.01); B02C 13/20 (2006.01);
U.S. Cl.
CPC ...
B01F 7/00608 (2013.01); B01F 7/0075 (2013.01); B01F 7/00708 (2013.01); B01F 7/00758 (2013.01); B01F 7/00775 (2013.01); B01F 7/00783 (2013.01); B01F 7/00858 (2013.01); B01F 7/00875 (2013.01); B02C 13/205 (2013.01); B02C 17/161 (2013.01); B02C 17/166 (2013.01);
Abstract

A device () for mixing which comprises a housing () with at least one inlet (). A first process region () mixes the supplied substances which are introduced via the inlet () while a second process region () discharges the mixture via an outlet (). A first gap-forming element (), preferably a rotor, is assigned to the first process region () and comprises openings (), and a second gap-forming element (), preferably a stator, is assigned to the second process region () and corresponds with the first gap-forming element (), wherein the second gap-forming element () comprises openings (). At least one of the gap-forming elements () is rotatable relative to the other gap-forming element (). The openings () of the first and second gap-forming elements () are arranged such that a mixture passes through the openings from the first into the second process region.


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