The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2021

Filed:

Apr. 08, 2019
Applicants:

Foundation of Soongsil University-industry Cooperation, Seoul, KR;

Sogang University Research & Business Development Foundation, Seoul, KR;

Inventors:

Moon Sung Kang, Seoul, KR;

Jeong Ho Cho, Seoul, KR;

Jee Hye Yang, Bucheon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0018 (2013.01); H01L 51/0003 (2013.01); H01L 51/502 (2013.01); H01L 51/504 (2013.01);
Abstract

The present disclosure provides a quantum dot thin film that is formed by cross-linking ligands of quantum dots with a photo cross-linker containing two or more azide groups. According to still another aspect of the present disclosure, a method for forming a quantum dot pattern includes: forming a quantum dot layer on a substrate by coating the substrate with a solution including quantum dots and a photo cross-linker containing two or more azide groups; placing a mask having a pattern on the quantum dot layer and performing UV exposure on the quantum dot layer; and forming a quantum dot pattern by removing a non-exposed region of the quantum dot layer.


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