The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2021
Filed:
Nov. 05, 2019
Applicant:
Imec Vzw, Leuven, BE;
Inventors:
Boon Teik Chan, Wilsele, BE;
Jean-Francois de Marneffe, Bossut-Gottechain, BE;
Daniil Marinov, Saint Petersburg, RU;
Han Chung Lin, Heverlee, BE;
Inge Asselberghs, Heverlee, BE;
Assignee:
IMEC VZW, Leuven, BE;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); H01L 21/02 (2006.01); H01L 21/78 (2006.01); H01L 29/24 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6836 (2013.01); H01L 21/02568 (2013.01); H01L 21/7806 (2013.01); H01L 29/24 (2013.01); H01L 29/78696 (2013.01); H01L 2221/68363 (2013.01);
Abstract
In a first aspect, the present disclosure relates to a method for removing an organic sacrificial material from a 2D material, comprising: providing a target substrate having thereon the 2D material and a layer of the organic sacrificial material over the 2D material, infiltrating the organic sacrificial material with a metal or ceramic material, and removing the organic sacrificial material.