The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2021
Filed:
Jul. 27, 2018
National University of Singapore, Singapore, SG;
Jeroen Anton Van Kan, Singapore, SG;
Xinxin Xu, Singapore, SG;
Santhana Ramam Pattabiraman, Singapore, SG;
Rudy Pang, Singapore, SG;
National University of Singapore, Singapore, SG;
Abstract
An ionization chamber chip, a nano-aperture ion source, a proton beam writing system, and a method of fabricating an ionization chamber chip. The method comprises the step of providing a first substrate comprising a first depression formed in a back surface thereof; providing a backing element attached at the back surface of the first substrate such that a chamber is formed comprising at least the first depression; forming a gas inlet in the first substrate in fluid communication with the chamber; and forming a first aperture structure in the first substrate in fluid communication with the chamber.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile