The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2021
Filed:
Oct. 02, 2018
Headway Technologies, Inc., Milpitas, CA (US);
Tdk Corporation, Tokyo, JP;
Yoshitaka Sasaki, Santa Clara, CA (US);
Hiroyuki Ito, Milpitas, CA (US);
Hironori Araki, Milpitas, CA (US);
Seiichiro Tomita, Milpitas, CA (US);
Atsushi Iijima, Tokyo, JP;
HEADWAY TECHNOLOGIES, INC., Milpitas, CA (US);
TDK CORPORATION, Tokyo, JP;
Abstract
A capacitor includes a dielectric structure formed of a sintered dielectric, and a first electrode and a second electrode each formed of a conductor. The dielectric structure includes a wall. The first electrode and the second electrode are insulated from each other by the wall. The wall has a height which is a dimension in a first direction, and a thickness which is a dimension in a second direction orthogonal to the first direction, the height being greater than the thickness. The wall has a non-straight shape when seen in the first direction. A manufacturing method for the capacitor includes forming the dielectric structure, and forming the first electrode and the second electrode simultaneously after the formation of the dielectric structure.