The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2021

Filed:

May. 26, 2020
Applicant:

Apple Inc., Cupertino, CA (US);

Inventor:

Subodh Asthana, Sunnyvale, CA (US);

Assignee:

Apple Inc., Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 1/20 (2006.01);
U.S. Cl.
CPC ...
G06T 1/20 (2013.01);
Abstract

A method comprises obtaining a first plurality of render commands comprising at least a geometry stage and a fragment stage. An identification may be made as to which of the geometry stages of the first plurality of render commands are idempotent. Dependency information is determined for the first plurality of render commands, e.g., identifying and labeling both 'true' and 'artificial' dependencies between the stages of the commands. The first plurality of render commands may be encoded and executed by a graphics processing unit (GPU) according to a labeled execution graph generated based on the dependency information. During execution, the GPU may attempt to “opportunistically” launch at least one identified idempotent geometry stage command for which at least one artificial barrier still remains. If the opportunistically-launched geometry stage work fails, the work may be discarded, and the method may wait until all barriers have been met before attempting to relaunch it.


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