The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2021

Filed:

Jan. 22, 2019
Applicant:

Insyte Systems, Inc., Newark, CA (US);

Inventors:

Jerome Chandra Bhat, Palo Alto, CA (US);

Jim Chih-Min Cheng, Fremont, CA (US);

Richard Ian Olsen, Truckee, CA (US);

Assignee:

InSyte Systems, Inc., Newark, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/407 (2006.01); G01N 27/404 (2006.01); G01N 27/30 (2006.01); G01N 27/416 (2006.01);
U.S. Cl.
CPC ...
G01N 27/4078 (2013.01); G01N 27/304 (2013.01); G01N 27/404 (2013.01); G01N 27/407 (2013.01); G01N 27/4166 (2013.01);
Abstract

An electrochemical sensor device that is efficiently and economically produced at the chip level for a variety of applications is disclosed. In some aspects, the device is made on or using a wafer technology whereby a sensor chamber is created by said wafer and a gas port allows for a working electrode of the sensor to detect certain gases. Large scale production is possible using wafer technology where individual sensors are produced from one or more common wafers. Integrated circuits are made in or on the wafers in an integrated way so that the wafers provide the substrate for the integrated circuitry and interconnects as well as providing the definition of the chambers in which the gas sensors are disposed.


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