The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2021

Filed:

Dec. 16, 2019
Applicants:

Michael Vidra, Export, PA (US);

Daniel Jon Schutzer, Irwin, PA (US);

Inventors:

Michael Vidra, Export, PA (US);

Daniel Jon Schutzer, Irwin, PA (US);

Assignee:

Tech Met, Inc., Glassport, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/04 (2006.01); C09K 13/08 (2006.01); C09K 13/12 (2006.01); C23F 1/16 (2006.01); C23F 1/28 (2006.01);
U.S. Cl.
CPC ...
C23F 1/28 (2013.01); C09K 13/08 (2013.01); C09K 13/12 (2013.01);
Abstract

Compositions and methods for etching cobalt chromium alloys are disclosed. The compositions generally include at least two mineral acids, certain component metals of the alloy to be etched, and optionally iron (Fe). For example, when etching a cobalt chromium molybdenum alloy, the metals may include chromium (Cr), molybdenum (Mo), and optionally, cobalt (Co). The at least two mineral acids may include hydrochloric acid (HCl), nitric acid (HNO), and hydrofluoric acid (HF). The methods provide for etching an entire surface of a substrate or etching a surface of a substrate in a pattern using selective coating patterns and/or coating removal. Thus, unlimited patterns, as well as etch depths and variations in etch depths are achievable using the compositions and methods disclosed.


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