The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2021

Filed:

Jul. 25, 2016
Applicant:

Basf Coatings Gmbh, Münster, DE;

Inventors:

Pieter Jan De Roij, Eindhoven, NL;

Ernst Dullemeijer, Eindhoven, NL;

Eduard Renier Francisca Clerkx, Eindhoven, NL;

Assignee:

BASF Coatings GmbH, Münster, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45551 (2013.01); C23C 16/4584 (2013.01); C23C 16/4586 (2013.01); C23C 16/45553 (2013.01); C23C 16/45561 (2013.01); C23C 16/45578 (2013.01); C23C 16/545 (2013.01);
Abstract

A deposition apparatus including a frame and a cylindrical drum with a cylindrical surface that extends along a central axis. The drum has a first and a second end surface, which extend perpendicularly to the central axis. The drum is rotatably mounted in the frame and includes a plurality of gas zones positioned on the cylindrical surface. The included gas channels extend within the drum. At least a number of the gas zones are in gas connection with at least two channels. The deposition apparatus includes closing elements for closing off all but one of the at least two channels with which a said gas zone is in gas connection so that the type of gas supplied to the various gas zones along the drum surface is programmable.


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