The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2021
Filed:
Nov. 26, 2019
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
John Tolle, Phoenix, AZ (US);
Eric Hill, Phoenix, AZ (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); H05B 3/26 (2006.01); C23C 16/46 (2006.01); C23C 16/458 (2006.01); H05B 6/10 (2006.01); C23C 14/02 (2006.01); C23C 14/50 (2006.01); C23C 16/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); C23C 14/021 (2013.01); C23C 14/50 (2013.01); C23C 16/0209 (2013.01); C23C 16/0218 (2013.01); C23C 16/458 (2013.01); C23C 16/4582 (2013.01); C23C 16/46 (2013.01); H05B 3/26 (2013.01); H05B 6/105 (2013.01);
Abstract
A reactor system and related methods are provided which may include a heating element in a wafer tray. The heating element may be used to heat the wafer tray and a substrate or wafer seated on the wafer tray within a reaction chamber assembly, and may be used to cause sublimation of a native oxide of the wafer.