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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11053583 B1

PDFFull Text
Expired
Date of Patent:
Jul. 06, 2021

Filed:

Nov. 09, 2017

Particle reduction during sputtering deposition

Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

James Gregory Couillard, Ithaca, NY (US);

Ming-Huang Huang, Ithaca, NY (US);

Assignees:

CORNING INCORPORATED, Corning, NY (US);

VIEW, INC., Milpitas, CA (US);

Attorney:
Primary Examiner:

Yuechuan Yu

Int. Cl.
CPC ...
C23C 14/50 (2006.01); C03C 17/00 (2006.01); C23C 14/56 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
C23C 14/50 (2013.01); C03C 17/002 (2013.01); C23C 14/564 (2013.01); H01L 21/6715 (2013.01); H01L 21/68785 (2013.01); C03C 2218/151 (2013.01); C03C 2218/154 (2013.01);
Abstract

Described herein are apparatuses and methods for holding a substrate in a position that minimizes particle contamination of the substrate when the substrate is being coated. Along with the apparatus, processes for reducing particle reduction on substrates are provided. The articles and processes described herein are useful in making coated glass substrates, such as used in electrochromic, photochromic, or photovoltaic technologies.

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Couillard, James. (2021). Particle reduction during sputtering deposition (U.S. Patent No. 11053583). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11053583

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