The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2021
Filed:
May. 25, 2017
Nikko Chemicals Co., Ltd., Tokyo, JP;
Cosmos Technical Center Co., Ltd., Tokyo, JP;
Toagosei Co., Ltd., Tokyo, JP;
NIKKO CHEMICALS CO., LTD., Tokyo, JP;
COSMOS TECHNICAL CENTER CO., LTD., Tokyo, JP;
TOAGOSEI CO., LTD., Tokyo, JP;
Abstract
A subject of the present invention is to provide a cosmetic for unevenness correction which has an excellent effect of concealing wrinkles and pores and correcting skin unevenness and has good compatibility with a makeup cosmetic. The present inventors have found that the cosmetic for unevenness correction which conceals wrinkles and pores and has good compatibility with a makeup cosmetic at the time of application can be easily provided by using a polyacrylate water-absorbing polymer having a specific water absorption capacity, but not a water-soluble macromolecule having a thickening effect commonly used in cosmetics, and they thus have completed the present invention. That is, the present invention provides a cosmetic for unevenness correction comprising the polyacrylate water-absorbing polymer which has an excellent effect of concealing wrinkles and pores, and the polyacrylate water-absorbing polymer has an average swollen particle size of 10 to 150 μm, an average dry particle size of 10 to 50 μm and a water absorbency of 5 to 50 g/g.