The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 2021

Filed:

Oct. 27, 2017
Applicant:

Rockwell Collins, Inc., Cedar Rapids, IA (US);

Inventors:

Shih-Yih Young, Marion, IA (US);

Kristen M. Jerome, Monticello, IA (US);

Assignee:

Rockwell Collins, Inc., Cedar Rapids, IA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G05D 1/00 (2006.01); B64D 43/00 (2006.01); G01C 23/00 (2006.01); G05D 1/10 (2006.01);
U.S. Cl.
CPC ...
G05D 1/101 (2013.01); B64D 43/00 (2013.01); G01C 23/00 (2013.01);
Abstract

Guidance laws for generating a control command for controlling, directing, or maneuvering, a platform, or displaying a maneuver for the platform, to track a defined path upon detecting a deviation from the defined path relative to a non-linear desired path being traversed. The non-linear desired path may be a curved lateral ground path or a curved vertical ground path with a containment region forming a control boundary within which platform deviations from the defined path are contained. The guidance laws are enhanced to maintain a position of the platform within the containment region based on a threshold and a degree of accuracy associated with the threshold. Non-ideal conditions and circumstances, such as external forces, relatively low operating speeds, control delays, and discontinuities in the defined path are accounted for to reduce total system error (TSE), reduce lateral and vertical deviations, and increase precision and accuracy of platform control.


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