The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2021
Filed:
Jul. 21, 2020
Applicant:
Molecular Imprints, Inc., Austin, TX (US);
Inventors:
Vikramjit Singh, Pflugerville, TX (US);
Michael Nevin Miller, Austin, TX (US);
Frank Y. Xu, Austin, TX (US);
Assignee:
Molecular Imprints, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/118 (2015.01); G03F 7/00 (2006.01); B29C 33/42 (2006.01); B29C 59/02 (2006.01); B29C 59/16 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 33/424 (2013.01); B29C 59/022 (2013.01); B29C 59/16 (2013.01); G03F 7/0015 (2013.01); G03F 9/7053 (2013.01);
Abstract
An imprint lithography method of configuring an optical layer includes imprinting first features of a first order of magnitude in size on a side of a substrate with a patterning template, while imprinting second features of a second order of magnitude in size on the side of the substrate with the patterning template, the second features being sized and arranged to define a gap between the substrate and an adjacent surface.