The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 2021

Filed:

Apr. 09, 2019
Applicant:

Olympus Corporation, Hachioji, JP;

Inventors:

Yasuo Yonemaru, Tokyo, JP;

Kengo Osawa, Kamiina, JP;

Assignee:

OLYMPUS CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/02 (2006.01); G02B 9/06 (2006.01);
U.S. Cl.
CPC ...
G02B 21/02 (2013.01); G02B 9/06 (2013.01);
Abstract

A dry microscope objective with a 20-fold magnification or lower that includes a first lens group having a positive refractive power and a second lens group having a positive refractive power, wherein the first and second lens groups have concave surfaces adjacent to each other and facing each other, and the microscope objective satisfies the following conditional expressions:1.4≤((1)−(0))/DOF≤2.3  (1)0≤()≤0.1λ(0≤≤0.7)  (2)where Windicates a function of a d-line optimization position that is an longitudinal position at which an RMS wavefront aberration in a d line at the object height ratio is minimized; DOFindicates a depth of focus for the d line; Windicates a function of an RMS wavefront aberration in a C line that occurs at the d-line optimization position; Fiy indicates the object height ratio; and λindicates the wavelength of the d line.


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