The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2021
Filed:
Oct. 29, 2018
Applicant:
Schlumberger Technology Corporation, Sugar Land, TX (US);
Inventors:
John Rasmus, Richmond, TX (US);
Gong Li Wang, Sugar Land, TX (US);
Dean M. Homan, Sugar Land, TX (US);
Natalie Uschner-Arroyo, Pittsburgh, PA (US);
Assignee:
SCHLUMBERGER TECHNOLOGY CORPORATION, Sugar Land, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01V 3/28 (2006.01); G01V 3/30 (2006.01); G01V 3/38 (2006.01);
U.S. Cl.
CPC ...
G01V 3/28 (2013.01); G01V 3/30 (2013.01); G01V 3/38 (2013.01);
Abstract
A formation characterization system can include a processor; memory accessibly by the processor; instructions stored in the memory and executable by the processor to instruct the system to: acquire induction measurements in a borehole in a formation using an induction tool; determine dielectric properties of the formation using the induction measurements; and generate a log that characterizes particles in the formation based on the dielectric properties.