The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 2021

Filed:

Jul. 01, 2019
Applicant:

Schlumberger Technology Corporation, Sugar Land, TX (US);

Inventors:

Shin Utsuzawa, Arlington, MA (US);

Anatoly Dementyev, Sugar Land, TX (US);

Nicholas Heaton, Houston, TX (US);

Cole Mann, Sugar Land, TX (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 33/38 (2006.01); G01N 24/08 (2006.01); G01R 33/383 (2006.01); G01V 13/00 (2006.01); G01V 3/32 (2006.01);
U.S. Cl.
CPC ...
G01R 33/3802 (2013.01); G01N 24/081 (2013.01); G01R 33/383 (2013.01); G01R 33/3808 (2013.01); G01V 13/00 (2013.01); G01V 3/32 (2013.01);
Abstract

A method for fabricating a magnet on a nuclear magnetic resonance logging tool includes identifying a desired magnetic field strength at a predetermined depth of investigation, receiving a set of magnet segments configured for deployment on the logging tool in a magnet arrangement which make up a magnet array on the logging tool, processing a magnetic strength and an angular offset of selected magnet segments and their unique location in the magnet array to compute corresponding magnetic field strength solutions at the predetermined depth of investigation, selecting one magnet arrangement solution that minimizes a difference between the magnetic field strength solution and the desired magnetic field strength at the predetermined depth of investigation, and deploying the magnet segments on the logging tool according to the selected magnet arrangement solution to fabricate the magnet.


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