The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 2021

Filed:

Aug. 17, 2017
Applicant:

Kitz Sct Corporation, Tokyo, JP;

Inventor:

Chokuto Kou, Gunma, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16K 7/00 (2006.01); F16K 7/14 (2006.01); F16K 7/12 (2006.01); F16K 31/60 (2006.01); F16K 31/06 (2006.01);
U.S. Cl.
CPC ...
F16K 7/14 (2013.01); F16K 7/126 (2013.01); F16K 31/06 (2013.01); F16K 31/60 (2013.01);
Abstract

A diaphragm valve and a flow rate control device for a semiconductor manufacturing apparatus are configured so as to allow an increase of a valve flow rate while avoiding an increase in size of the valve. The diaphragm valve includes a diaphragm with an outer periphery being pressed and a valve seat part in a valve chamber of a body having an inflow path and an outflow path, with the diaphragm being configured to open and close the valve chamber by an ascending/descending motion of a stem. The diaphragm has a substantially-flat cross sectional form having a substantially-planar center region and a boundary region. The boundary region is on an outer peripheral side of the center region and has a radius of curvature smaller than that of the center region, and the boundary region is positioned near an outer peripheral side of the valve seat part.


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