The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 2021

Filed:

Jul. 09, 2018
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Soyoung Lee, Yongin-si, KR;

Hyunjae Lee, Seongnam-si, KR;

Ik Soo Kim, Yongin-si, KR;

Jang-Hee Lee, Yongin-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01L 21/02 (2006.01); C23C 16/44 (2006.01); C23C 16/448 (2006.01); C23C 14/24 (2006.01); B01B 1/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/4412 (2013.01); C23C 16/4483 (2013.01); H01L 21/0228 (2013.01); H01L 21/02175 (2013.01); B01B 1/005 (2013.01); C23C 14/243 (2013.01); C23C 16/4485 (2013.01); C23C 16/45561 (2013.01);
Abstract

Provided are a precursor supply unit, a substrate processing system, and a method of fabricating a semiconductor device using the same. The precursor supply unit may include an outer container, an inner container provided in the outer container and used to store a precursor source, a gas injection line having an injection port, which is provided below the inner container and in the outer container and is used to provide a carrier gas into the outer container, and a gas exhaust line having an exhaust port, which is provided below the inner container and in the outer container and is used to exhaust the carrier gas in the outer container and a precursor produced from the precursor source.


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