The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 2021

Filed:

Sep. 11, 2019
Applicant:

Xiamen University, Fujian, CN;

Inventors:

Lizong Dai, Fujian, CN;

Chao Liu, Fujian, CN;

Guorong Chen, Fujian, CN;

Jiamei Huang, Fujian, CN;

Zhongyu Li, Fujian, CN;

Conghui Yuan, Fujian, CN;

Yiting Xu, Fujian, CN;

Birong Zeng, Fujian, CN;

Wei′ang Luo, Fujian, CN;

Assignee:

Xiamen University, Xiamen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K 3/36 (2006.01); C08K 9/06 (2006.01); C08K 9/08 (2006.01); C08K 9/10 (2006.01); C08L 63/00 (2006.01);
U.S. Cl.
CPC ...
C08K 3/36 (2013.01); C08K 9/06 (2013.01); C08K 9/08 (2013.01); C08K 9/10 (2013.01); C08L 63/00 (2013.01); C08J 2335/00 (2013.01); C08K 2201/011 (2013.01);
Abstract

The present disclosure discloses a method of manufacturing silicon dioxide nanoparticles modified by a polymer containing phosphorus and nitrogen, which relates to organic/inorganic hybrid nanoparticles, dispersing SiOin an organic solvent, then adding THPS, stirring, and finally adding p-phenylenediamine, reacting, centrifuging, washing, and drying to obtain silicon dioxide nanoparticles modified by a polymer containing phosphorus and nitrogen. The silicon dioxide nanoparticles modified by the polymer containing phosphorus and nitrogen have effects in flame retardancy, strengthening effect of polymer matrixes, and are expected to be widely used in the halogen-free synergistic flame retardancy of polymer materials.


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