The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2021
Filed:
Jul. 28, 2017
Tosoh Corporation, Yamaguchi, JP;
Yukie Maejima, Mie, JP;
Satoru Kondou, Mie, JP;
Shinya Imatomi, Kanagawa, JP;
Satoru Yamada, Kanagawa, JP;
Hiroyuki Ito, Kanagawa, JP;
TOSOH CORPORATION, Yamaguchi, JP;
Abstract
The present invention addresses the problem of providing a block copolymer which is useful as a surface treatment agent for cell culture substrates, said surface treatment agent enabling cell separation in a short period of time. The above-mentioned problem is solved by a block copolymer that includes the following blocks (A), (B) and (C): (A) a temperature-responsive polymer block that has a lower critical solution temperature (LCST) within the range of from 0° C. to 50° C. with respect to water (B) a hydrophilic polymer block that does not have an LCST within the range of from 0° C. to 50° C., while having an HLB value within the range of from 9 (inclusive) to 20 (exclusive) (C) a hydrophobic polymer block that does not have an LCST within the range of from 0° C. to 50° C., while having an HLB value within the range of from 0 (inclusive) to 9 (exclusive).